Open access
Oct 2026
Pyrolyzed Photoresist as a Continuous‐Tone Mask for Grayscale Lithography
ABSTRACT Grayscale lithography enables single‐step fabrication of continuous 3D surface relief for complex optics, MEMS, and scalable replication templates. However, its broad adoption is hindered by the cost, complexity, and resolution constraints associated with fabricating high‐quality grayscale masks. Here, we addr...
T. Creason, Gavin C. Gee, Zachary T. Piontkowski et al.
· Advancement of science · 0 citations