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D. Kekuda

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Oct 2026

Optical Dispersion and Dielectric Analysis of Sputtered Cr2O3 Thin Films for Optoelectronic Applications

Chromium oxide thin films were deposited by DC magnetron sputtering under varying oxygen flow rates (14%–24%). This study evaluates the properties of both the as‐deposited and the post‐annealed samples. X‐ray diffraction (XRD) confirms the evolution from amorphous to crystalline Cr2O3 and reduced structural disorder af...

G. S., D. Kekuda · 0 citations

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