Optical Dispersion and Dielectric Analysis of Sputtered Cr2O3 Thin Films for Optoelectronic Applications
Chromium oxide thin films were deposited by DC magnetron sputtering under varying oxygen flow rates (14%–24%). This study evaluates the properties of both the as‐deposited and the post‐annealed samples. X‐ray diffraction (XRD) confirms the evolution from amorphous to crystalline Cr2O3 and reduced structural disorder af...