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Open access Aug 2026

Characterization of silicon carbide thin films deposited by PECVD and PLD for MEMS infrared applications

Silicon carbide (SiC) is a promising material for uncooled infrared (IR) Micro-Electro-Mechanical Systems (MEMS) owing to its high elastic modulus, thermal stability, and infrared absorption properties [1–3]. In this work, we report a comparative characterization of 500 nm thick SiC thin films deposited by Plasma-Enhan...

Mohammed Mahdi, Lamia Menasri, H. Khales et al. · 0 citations

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