Optimization of Oxygen Flow for Tailoring the Properties of AZO Thin Films Deposited by DC Magnetron Sputtering
This study reports on the preparation of aluminum-doped zinc oxide (AZO) thin films by DC magnetron sputtering using a Zn/Al target. The influence of reactive oxygen gas flow rate (10–100 sccm) was investigated while maintaining a constant Ar flow rate of 40 sccm. Films were deposited on both silicon and glass substrat...