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Open access Oct 2026

Data-driven surface figure analysis and process optimization for full-aperture continuous polishing based on processing data

Full-aperture continuous polishing (FCP) is widely used in the ultra-precision fabrication of large-aperture planar optical elements, but surface-figure control still relies heavily on operator experience because of the complex coupling among process parameters, machine states, and environmental conditions. This pape...

D. Liao, Qi-Shan Hu, Wei Wang et al. · 0 citations
Open access Sep 2026

High-Sensitivity Optical Scattering Inspection Method for Nanoscale Morphological Defects on SiC Wafers

Silicon carbide (SiC) has emerged as a critical wide-bandgap semiconductor for power electronics. However, its high optical transmittance and relatively low dielectric contrast impose fundamental limitations on nanoscale defect detection compared with conventional silicon (Si) wafers. In this work, a numerical framewor...

Jia-Qi Hu, Hong-Li Liu, Yi-Hong Huang et al. · 0 citations

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