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Shuai Zhao

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Open access Sep 2026

Optical Metrology for X-ray Optics at the Hefei Advanced Light Facility (HALF)

The development of fourth-generation diffraction-limited synchrotron radiation sources, such as the Hefei Advanced Light Facility (HALF), places increasingly stringent demands on the fabrication and metrology of the X-ray optical components. The beamlines require mirrors and gratings with atomic-level surface quality...

Shuai Zhao, Chong-Qing Zhou, Shuo Fu et al. · 0 citations

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