Author

T. Iwai

2 papers indexed here

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Review Sep 2026

Curvilinear mask metrology: toward standardizing contour-based metrics for EUV mask qualification

Curvilinear EUV mask layouts challenge conventional qualification because local geometry changes continuously along the contour. Sparse CD-style sampling can therefore miss or average out the regions that drive the measured response. We present a contour-based evaluation workflow using PMsite outputs and mask SEM data...

B. Baskaran, J. Bekaert, K. Miyaguchi et al. · Photomask Japan · 0 citations

Sep 2026

A novel EPE measurement method for curvilinear pattern with Multigon format

In recent years, wafer process windows have become an issue in advanced node wafer lithography. Inverse lithography technology (ILT), a well-known method for obtaining the optimum process window for lithography, has not been practical due to the huge computational effort and complex pattern geometries required. However...

Ryo Onodera, Hiroyuki Takahashi, Yasuaki Hisatani et al. · Photomask Japan · 0 citations