Author

T. Polakovic

2 papers indexed here

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Open access Oct 2026

Control of disorder and superconductivity in sputtered TiN thin films via substrate RF bias

Titanium nitride thin films are prepared using DC reactive magnetron sputtering at room temperature, with an RF bias applied to the substrate to systematically control film growth. By adjusting the substrate RF bias, the degree and length scale of disorder are tuned, leading to pronounced changes in film microstructure...

S. Kruhlov, V. Yefremenko, T. Cecil et al. · APL Materials · 1 citation

Preprint Sep 2026

Disorder-driven transport in ZrN thin films grown by ion-beam-assisted sputtering

We investigate the structural and electronic transport properties of zirconium nitride (ZrN) thin films grown by dc ion-beam assisted sputtering (IBAS) as a function of nitrogen partial pressure, sputtering power and deposition temperature. Variation of growth conditions enables controlled tuning from disordered metall...

M. DiPreta, Samuel C. Jiang, S. Kruhlov et al. · 0 citations