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Wei-Hua Li

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Oct 2026

Optimizing Sparsely Patterned Polymer Brushes for Guiding Block Copolymers to Form Large-Scale Ordered Lines

Directed self-assembly (DSA), which combines the self-assembly of block copolymers with conventional photolithography, can improve lithographic precision by achieving density multiplication, and is thus regarded as one of the promising next-generation lithography techniques. One of the most applicable patterns fabric...

Wen-Jing Zheng, Wei-Hua Li, Qing-Liang Song · 0 citations

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