Sep 2026
A novel EPE measurement method for curvilinear pattern with Multigon format
In recent years, wafer process windows have become an issue in advanced node wafer lithography. Inverse lithography technology (ILT), a well-known method for obtaining the optimum process window for lithography, has not been practical due to the huge computational effort and complex pattern geometries required. However...
Ryo Onodera, Hiroyuki Takahashi, Yasuaki Hisatani et al.
· Photomask Japan · 0 citations