Aug 2026· Metrology· Vol 6, pp. 54· 0 citations· 38 references
Abstract
Precise measurement of large mirrors is essential for high-performance space-based optics. Traditionally, laser interferometry provides high accuracy but faces challenges related to the requirements of computer-generated holograms (CGHs) and the transformation of standard wavefronts to match complex test surfaces. This paper presents a proof-of-concept contact-based surface metrology method for large mirrors. To reduce drift errors caused by stylus instability or contact loss, a wavefront-based calibration method was developed to suppress measurement artifacts while preserving intrinsic surface errors. The method was tested on a concave aspherical mirror using a tactile coordinate measuring machine (CMM), and its accuracy was evaluated by comparing deviations between calibrated CMM error maps and laser-based measurements. Experimental results demonstrated that the XENO CMM achieved a global metric accuracy comparable to interferometric systems for relevant geometric parameters. These findings suggest that ultra-precision CMMs combined with focus point calibration can provide practical preliminary surface verification and serve as a flexible alternative to laser interferometry when global geometric accuracy is the primary concern. Future work will enhance robustness by addressing higher-order aberrations.
High numerical aperture (NA) microscope objectives are critical in semiconductor wafer defect inspection. Conventional wavefront measurement approaches are limited by the precision of reference wavefronts and inherent systematic errors, which restricts their performance in high-precision metrology. To address these iss...
William Yang Wang, Xin-Hua Chen· International Conference on...· 0 citations
High‑accuracy metrology is essential for fabricating and optimizing free‑form X‑ray mirrors, where nanometer‑scale precision demands reliable calibration of instrument performance. Binary pseudo‑random array (BPRA) “white‑noise” artifacts enable direct determination of an instrument’s transfer function (ITF). To extend...
K. Munechika, U. Griesmann, C. Pina-Hernandez et al.· Advances in X-Ray/EUV Source...· 0 citations
Interferometric testing of powered optics provides high accuracy but relies on reference optics, precise alignment, and a stable environment. This study presents a non-interferometric multiplane-accelerated Wirtinger flow (MP-AWF) method for recovering spherical-lens wavefronts from axially sampled diffraction intensit...
The segmented primary mirror represents a major breakthrough in large-scale optical engineering, overcoming the long-standing difficulties associated with the fabrication, transportation, and installation of large monolithic primary mirrors. During manufacturing and alignment, interferometric testing based on computer-...
Concentrating solar mirrors require high optical precision to concentrate sunlight onto a target receiver. This motivates the need for metrology systems to measure mirror quality. Surface normal slope is the key functional characteristic of a concentrating solar mirror, because the surface normal defines the reflection...
Randy C. Brost, Zoe Wilf· Advances in solar energy· 0 citations
Legacy-process semiconductors continue to support a wide range of electronic devices used in daily life. In semiconductor manufacturing, accurate mask pattern registration is essential, as it directly affects lithographic overlay performance and device yield. Registration systems for legacy nodes therefore require high...
Hironori Kawashima, Koichiro Fukaya, M. Mizumura et al.· Photomask Japan· 0 citations
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