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Hyperspectral wafer surface classification based on a diffusion-model-enhanced incremental learning architecture

Abstract Accurate wafer surface classification is essential for semiconductor process control, but its practical application is limited by the small number of labeled hyperspectral samples and the continuous emergence of previously unseen surface classes. To address these challenges, this study proposes a diffusion-mod...

Zhizhu Ge, Zhao Ding, Yang Wang et al. · 0 citations

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