Murali E.

Emerging Nanoelectronic Technologies for Next-Generation VLSI: Devices, Challenges, and Prospects

The continuous scaling of CMOS technology enables significant progress in performance and integration density in VLSI. However, due to short-channel effects, leakage currents, interconnection delays, variability effects, and power-density limitations, at the current sub-5 nm feature size, the conventional scaling down...